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IBM to enlist high-k metal gate technology with its 45nm chips

Alongside Intel’s news of 45nm process technology, IBM today announced its own 45nm technological advancements that apply to products manufactured in its East Fishkill, NY plant starting in 2008.

Working with AMD and its other development partners including Sony and Toshiba, IBM has found a way to construct a critical part of the transistor with high-k metal gates, that substitutes a new material into a critical portion of the transistor that controls its primary on/off switching function. The material provides superior electrical properties compared to its predecessor, silicon dioxide, enhancing the transistor's function while also reducing leakage.

As important as the new material is the method for introducing it into current manufacturing techniques. The creation of this transistor component with the new material was accomplished by the IBM team without requiring major tooling or process changes in manufacturing - an essential element if the technology is to be economically viable.

“Until now, the chip industry was facing a major roadblock in terms of how far we could push current technology,” said Dr. T.C. Chen, vice president of Science and Technology, IBM Research. “After more than ten years of effort, we now have a way forward. With chip technology so pervasive in our everyday lives, this work will benefit people in many ways.”



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Great news
By verndewd on 1/28/2007 6:21:50 PM , Rating: 2
At this point a person has got to admire how Intel is pushing the industry,or seems to.I thought High K would be late,from all my reading at applied and other lithography news sources.To come out and do the High K so soon just makes me applaud intels intellectual capacity.

I have been an strict AMD user for years,But seeing how Intel can solve the HF0 issues by itself and ahead of schedule,is really impressive.Hf is not an easy thing to purify,according to the periodic tables its among the most difficult to seperate from impurity.

What Intel did alone IBM did with several partners;amazing.
Perhaps these partners will stay together in developement and keep such drastic leads in performance down to a minimum in the future.Either way its good news for all enthusiasts to have lower power and higher perf.So regardles of who what when and why we all win.




RE: Great news
By flipsu5 on 1/29/2007 3:22:35 AM , Rating: 2
I know some of the guys who were behind the high-k announcements. It's really very good (and hard) work.

I noted in the other thread for Life with Penryn that the Intel CPU TDP did not go down dramatically with the high-k metal gate. In fact, for some important chips, it went up. Imagine if there were no high-k there. It could be even worse (although circuit techniques can also help reduce leakage significantly, independent of high-k).

It leads to think that everybody has to use this for 45 nm CPU. One of the big concerns was this would be expensive, since there would be few users, but it may become established technology by the time AMD starts 45 nm.


RE: Great news
By Master Kenobi (blog) on 1/29/2007 8:36:58 AM , Rating: 1
Which will likely be around the same time frame that Intel is polishing its 32nm process.


RE: Great news
By flipsu5 on 1/29/2007 10:18:45 AM , Rating: 2
quote:
Which will likely be around the same time frame that Intel is polishing its 32nm process.


...assuming no surprises...


RE: Great news
By Viditor on 1/29/2007 10:28:19 AM , Rating: 2
quote:
Which will likely be around the same time frame that Intel is polishing its 32nm process


Cmon guys...at least put a smiley face there.
You just know that some newb will read this and tell everyone that he read on DT that Intel is pushing their 32nm process ahead by 1.5 years...


RE: Great news
By jak3676 on 1/29/2007 10:51:23 AM , Rating: 2
let me go post that on the inquirer - I'll say I saw it here ;)


RE: Great news
By verndewd on 1/29/2007 6:57:33 PM , Rating: 2
found a pdf through a link shared at toms from the register uk,it lists beryllium as the metal gate.
http://www.theregister.co.uk/2007/01/28/intel_ibm_...

and heres a periodic table description.
http://periodic.lanl.gov/elements/4.html


RE: Great news
By verndewd on 1/29/2007 6:58:57 PM , Rating: 2
RE: Great news
By flipsu5 on 1/29/2007 7:20:55 PM , Rating: 2
Thanks for the link. The metal gate was still not identified though.


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