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To make 45nm process manufacturing easier: just add water

Intel has said on multiple occasions that its 45nm process is on track for production 2007. In fact, Intel began sampling its Penryn 45nm chips just several weeks ago. At the IEDM, IBM and AMD described three technologies that hope to compete with Intel’s 45nm development: the use of immersion lithography, which AMD says will “deliver enhanced microprocessor design definition and manufacturing consistency,” ultra-low-K interconnect dielectrics to enhance performance-per-watt ratio and multiple enhanced transistor strain techniques.

Current process technologies use conventional lithography, which has significant limitations in defining microprocessor designs beyond the 65nm process technology generation. Immersion lithography uses a projection lens filled with purified water as part of the step-and-repeat lithography -- think of the same principles applied to immersion microscopy.

Immersion lithography provides increased flow of light, depth of focus and improved image fidelity that can improve chip-level performance and manufacturing efficiency. For example, the performance of an SRAM cell shows improvements of approximately 15 percent due to this enhanced process capability, without resorting to more costly double-exposure techniques.

In addition, AMD and IBM say that the use of porous, ultra-low-K dielectrics reduces interconnect capacitance, wiring delay, as well as lowering power dissipation. This advance is enabled through the development of an ultra-low-K process integration that reduces the dielectric constant of the interconnect dielectric while maintaining the mechanical strength. The addition of ultra-low-K interconnect provides a 15 percent reduction in wiring-related delay as compared to conventional low-K dielectrics.

In spite of the increased packing density of the 45nm generation transistors, IBM and AMD demonstrated multiple enhanced transistor strain techniques that give an 80 per cent increase in p-channel transistor drive current and a 24 per cent increase in n-channel transistor drive current compared to unstrained transistors. The companies claim that their achievement results in the highest CMOS performance reported to date in a 45nm process technology.

In November 2005, AMD and IBM announced an extension of their joint development efforts until 2011 covering 32nm and 22nm process technology generations. AMD and IBM expect the first 45nm products using immersion lithography and ultra-low-K interconnect dielectrics to be available in mid-2008.



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RE: dang yo
By iNGEN on 12/13/2006 12:03:30 PM , Rating: 3
quote:
I just want to know if it will be below 250 dollars, use less than 60 watts at max and handle me playing a hot video game. Pwn noobs = rulz

The wirehead equivalent of Ebonics or Jive.

quote:
Russell, he wants a cheap machine that wont bake his room and will run all the games he wants to play at a good speed.

Followed by the white & nerdy translation, courtesy of Sulphademus.

Anyone remember that Ebonics language lesson mp3 that floated around the 'net about ten years ago?


RE: dang yo
By WhiteBoyFunk on 12/13/2006 12:59:26 PM , Rating: 2
Was it really started ten years ago? And yes, I remember it (what I saw was actually a slideshow) well...

I'm behind a proxy on this pc and can't look it up, but wasn't it something like -

White Guy - "You are beautiful. I would like to make love to you."
Mister T - "Damn girl, you stupid fly! Let me pull up to that bumper and smack that monkey!"

Rofl, it was pretty nice.


RE: dang yo
By masher2 (blog) on 12/13/2006 1:09:31 PM , Rating: 2
Ebonics dates back at least 20 years, and "jive" is even older. I'm sure I'm not the only person here who remembers the 'Jive Translator' from the movie Airplane.


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