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IBM's DUV technology could keep Moore's Law alive

IBM has announced new technology that will allow the semiconductor industry to create smaller integrated circuits. The company has developed 193 nanometer deep-ultraviolet optical lithography to “print” circuits that are only 29.9nm wide. In comparison, Intel’s new Core Solo and Core Duo processors are built on a 65nm process while AMD is still moseying around on 90nm lithography.

According to IBM’s Dr. Robert D. Allen, the industry will now have about seven years of breathing room before more drastic measures must be taken to preserve Moore’s Law: “Our goal is to push optical lithography as far as we can so the industry does not have to move to any expensive alternatives until absolutely necessary. This result is the strongest evidence to date that the industry may have at least seven years of breathing room before any radical changes in chip-making techniques would be needed.”

IBM’s latest breakthrough in optical immersion lithography technology could save the industry billions in developmental costs in the near term. Alternatives will still need to be developed though once DUV lithography is exhausted.





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